Multi-layer anti-reflection coatings containing at least one nanoporous layer optimized using non-analytical optimization algorithm, such as genetic algorithm | Available Intellectual Property | Rensselaer Polytechnic Institute

Multi-layer anti-reflection coatings containing at least one nanoporous layer optimized using non-analytical optimization algorithm, such as genetic algorithm

RPI ID: 2008-036-601

Innovation Summary:
This invention introduces an anti-reflection coating with ultra-low reflectance across a broad spectrum and a wide range of incident angles. The coating achieves less than 6% reflectance from 400–1600 nm and up to 70° incidence. It is ideal for optical devices, solar panels, and sensors requiring high transmission and minimal reflection.

Challenges / Opportunities:
Optical systems often suffer from reflection losses, especially at wide angles and across broad wavelength ranges. This invention addresses the need for high-performance anti-reflection coatings that maintain efficiency under diverse conditions. It opens opportunities in energy, imaging, and photonics industries where optical clarity and efficiency are critical.

Key Benefits / Advantages:
✔ Ultra-low reflectance
✔ Broadband and wide-angle performance
✔ Enhances optical efficiency
✔ Durable and scalable

Applications:
• Solar panels
• Optical sensors
• Imaging systems
• Photonic devices

Keywords:
#AntiReflectionCoating #BroadbandOptics #SolarEfficiency #OpticalEnhancement #LowReflectance

Intellectual Property:
US Issued Patent 11088291
Patent Information:
Inventors:
Sameer Chhajed
Jong Kyu Kim
Mei-Ling Kuo
Shawn Lin
Frank Mont
David Poxson
E. Fred Schubert
Martin Schubert
Keywords:
For Information, Contact:
Natasha Sanford
Licensing Associate
Rensselaer Polytechnic Institute
sanfon@rpi.edu