Plasma-Induced-THz-Spectroscopy | Available Intellectual Property | Rensselaer Polytechnic Institute

Plasma-Induced-THz-Spectroscopy

RPI ID: 2006-039-201

Innovation Summary:
This invention describes a method for generating terahertz radiation using plasma induced by electromagnetic radiation. It enables remote sensing of materials through phase transformation and plasma emission. The system can detect chemical and structural properties from a distance. It is ideal for security, environmental monitoring, and industrial inspection.

Challenge/Opportunity:
Remote sensing technologies often struggle with resolution and material specificity. This invention provides a non-contact method for high-resolution, material-specific detection. It addresses the need for safer and more accurate sensing in hazardous or inaccessible environments. The opportunity lies in its application to defense, safety, and quality control.

Key Benefits and Advantages:
✔ Non-contact sensing
✔ High-resolution terahertz imaging
✔ Material-specific detection
✔ Operates in harsh environments

Applications:
• Security screening
• Environmental monitoring
• Industrial inspection
• Scientific research

Keywords:
#Terahertz radiation #plasma emission #remote sensing #spectroscopy #non-contact detection

Intellectual Property:
US Issued Patent 7652253
Patent Information:
Inventors:
Jianming Dai
Xu Xie
Xi-Cheng Zhang
Keywords:
For Information, Contact:
Natasha Sanford
Licensing Associate
Rensselaer Polytechnic Institute
sanfon@rpi.edu